NewSkin team at ICMCTF 2024 - the 50th International Conference on Metallurgical Coatings and Thin Films
NewSkin team at ICMCTF 2024 - the 50th International Conference on Metallurgical Coatings and Thin Films
Published on 11 Jun 18:29 (10 months ago)
by AquaTT
NewSkin OITB partners Tomas Kubart & Daniel Fernandes (The Ångström Laboratory, Uppsala University) presented work on HiPIMS and TiO2 thin films with an invited talk, and a poster presentation at this premier international conference in the field of thin film deposition, characterization, and advanced surface engineering for scientists, technologists, and manufacturers.
Session: PP2-2-ThA HiPIMS, Pulsed Plasmas and Energetic Deposition II Moderators: Simizu Tetuhide, Tokyo Metropolitan University, Japan, Martin Rudolph, Leibniz Inst. of Surface Eng. (IOM), Germany
INVITED talk: PP2-2-ThA-3 Strategies for Low Temperature Reactive Deposition of Crystalline TiO2 Thin Films, Tomas Kubart, Uppsala University, Department of Electrical Engineering, Sweden
& Daniel Félix Fernandes presented a poster under topic Advanced Characterization, Modelling and Data Science for Coatings and Thin Films
Session: CM-ThP Advanced Characterization, Modelling and Data Science for Coatings and Thin Films (Symposium CM)
CM-ThP-8 In-Situ Characterization of the Crystallization Kinetics of Sputtered TiO2 Thin Films,
Daniel Félix Fernandes, Department of Electrical Engineering, Division of Solid-State Electronics, The Ångström Laboratory, Uppsala University, SE-751 03 Uppsala, Sweden; J. Hérnandez, Madrid Institute for Advanced Studies in Nanoscience (IMDEA Nanoscience), Ciudad Universitaria de Cantoblanco, C/ Faraday 9, 28049 Madrid, Spain; J. Martínez, ALBA Synchrotron, Carrer de la Llum 2-26, 08290 Cerdanyola del Vallés, Barcelona, Spain; T. Kubart, Department of Electrical Engineering, Division of Solid-State Electronics, The Ångström Laboratory, Uppsala University, SE-751 03 Uppsala, Sweden